Details

Advanced Nanoscale MOSFET Architectures


Advanced Nanoscale MOSFET Architectures

Current Trends and Future Perspectives
1. Aufl.

von: Kalyan Biswas, Angsuman Sarkar

103,99 €

Verlag: Wiley
Format: PDF
Veröffentl.: 23.05.2024
ISBN/EAN: 9781394188987
Sprache: englisch
Anzahl Seiten: 336

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Beschreibungen

<p><b>Comprehensive reference on the fundamental principles and basic physics dictating metal–oxide–semiconductor field-effect transistor (MOSFET) operation</b> <p><i>Advanced Nanoscale MOSFET Architectures </i>provides an in-depth review of modern metal–oxide–semiconductor field-effect transistor (MOSFET) device technologies and advancements, with information on their operation, various architectures, fabrication, materials, modeling and simulation methods, circuit applications, and other aspects related to nanoscale MOSFET technology. <p>The text begins with an introduction to the foundational technology before moving on to describe challenges associated with the scaling of nanoscale devices. Other topics covered include device physics and operation, strain engineering for highly scaled MOSFETs, tunnel FET, graphene based field effect transistors, and more. The text also compares silicon bulk and devices, nanosheet transistors and introduces low-power circuit design using advanced MOSFETs. <p>Additional topics covered include: <ul><li>High-k gate dielectrics and metal gate electrodes for multi-gate MOSFETs, covering gate stack processing and metal gate modification </li><li>Strain engineering in 3D complementary metal-oxide semiconductors (CMOS) and its scaling impact, and strain engineering in silicon–germanium (SiGe) FinFET and its challenges and future perspectives </li><li>TCAD simulation of multi-gate MOSFET, covering model calibration and device performance for analog and RF applications </li><li>Description of the design of an analog amplifier circuit using digital CMOS technology of SCL for ultra-low power VLSI applications </li></ul> <p><i>Advanced Nanoscale MOSFET Architectures </i>helps readers understand device physics and design of new structures and material compositions, making it an important resource for the researchers and professionals who are carrying out research in the field, along with students in related programs of study.
<p><b>Kalyan Biswas, PhD, </b> is an Assistant Professor in the ECE Department at MCKV Institute of Engineering in Liluah, Howrah, WB, India. <p><b>Angsuman Sarkar, PhD, </b> is a Professor in the ECE Department of the Kalyani Government Engineering College in Kalyani, Nadia, WB, India. He is a co-editor of the Wiley title <i>Optical Switching: Device Technology and Applications in Networks </i>(2022).
<p><b>Comprehensive reference on the fundamental principles and basic physics dictating metal–oxide–semiconductor field-effect transistor (MOSFET) operation</b> <p><i>Advanced Nanoscale MOSFET Architectures </i>provides an in-depth review of modern metal–oxide–semiconductor field-effect transistor (MOSFET) device technologies and advancements, with information on their operation, various architectures, fabrication, materials, modeling and simulation methods, circuit applications, and other aspects related to nanoscale MOSFET technology. <p>The text begins with an introduction to the foundational technology before moving on to describe challenges associated with the scaling of nanoscale devices. Other topics covered include device physics and operation, strain engineering for highly scaled MOSFETs, tunnel FET, graphene based field effect transistors, and more. The text also compares silicon bulk and devices, nanosheet transistors and introduces low-power circuit design using advanced MOSFETs. <p>Additional topics covered include: <ul><li>High-k gate dielectrics and metal gate electrodes for multi-gate MOSFETs, covering gate stack processing and metal gate modification </li><li>Strain engineering in 3D complementary metal-oxide semiconductors (CMOS) and its scaling impact, and strain engineering in silicon–germanium (SiGe) FinFET and its challenges and future perspectives </li><li>TCAD simulation of multi-gate MOSFET, covering model calibration and device performance for analog and RF applications </li><li>Description of the design of an analog amplifier circuit using digital CMOS technology of SCL for ultra-low power VLSI applications </li></ul> <p><i>Advanced Nanoscale MOSFET Architectures </i>helps readers understand device physics and design of new structures and material compositions, making it an important resource for the researchers and professionals who are carrying out research in the field, along with students in related programs of study.

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