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GENERAL ASPECTS OF CRYSTAL GROWTH TECHNOLOGY<br> Phase Diagrams for Crystal Growth<br> Fundamentals of Equilibrium Thermodynamics<br> Thermodynamics, Origin, and Control of Defects<br> Thermophysical Properties of Molten Silicon<br> SIMULATION OF INDUSTRIAL GROWTH PROCESSES<br> Yield Improvement and Defect Control in Bridgman-Type Crystal Growth with the Aid of Thermal Modeling<br> Modelling of Czochralski Growth of Large Silicon Crystals <br> Global Analysis of Effects of Magnetic Field Configuration on Melt/Crystal Interface Shape and Melt Flow in Cz-Si Crystal Growth<br> Modeling of Semitransparent Bulk Crystal Growth<br> COMPOUND SEMICONDUCTORS<br> Recent Progress in GaAs Growth Technologies at FREIBERGER<br> Interface Stability and Its Impact on Control Dynamics<br> Use of Forced Mixing via the Accelerated Crucible Rotation Technique (ACRT) in Bridgman Growth of Cadmium Mercury Telluride (CMT)<br> Crystal-Growth Technology for Ternary III-IV Semiconductor Production by Vertical Bridgman and Vertical Gradient Freezing Methods with Accelerated Crucible Rotation Technique<br> X-Ray Diffraction Imaging of Industrial Crystals<br> SCINTILLATOR CRYSTALS<br> Continuous Growth of Large Halide Scintillation Crystals<br> OXIDES<br> Phase Equilibria and Growth of Langasite-Type Crystals <br> Flame-Fusion (Verneuil) Growth of Oxides<br> CRYSTAL GROWTH FOR SUSTAINING ENERGY<br> Saving Energy and Renewable Energy Through Crystal Growth Technology <br> CRYSTAL MACHINING<br> Crystal Sawing Technology<br> Plasma Chemical Vaporization Machining and Elastic Emission Machining<br>

"The book is a must-have for industry and research." (Metall, October 2008)

Professor Hans J. Scheel started the Scheel Consulting company in 2001 after retiring from the Swiss Federal Institute of Technology. Starting out with a chemical background, he has more than 40 years of experience with crystal growth and epitaxy in university as well as industry. For his achievements in bulk crystal growth and epitaxy technologies, he received awards from IBM and from Swiss, British, Korean Crystal Growth Associations, was elected member of the Russian Academy of Engineering Sciences, and received his D.Sc. from Tohoku University, Japan. He is co-author and editor of 6 books, author of more than 100 publications and patents, has organized international workshops on crystal technology and has been visiting professor at Osaka and Tohoku Universities, Japan, as well as Shandong University, China.<br> <br> Dr. Peter Capper is a Materials Team Leader at SELEX Sensors and Airborne Systems Infrared Ltd (formerly BAE Systems), and has over 30 years of experience in the infrared material Cadmium Mercury Telluride (CMT). He holds the patent for the application of the accelerated crucible rotation technique to CMT growth and is recognised as a world authority on CMT. He has written and edited 6 books on electronic materials and devices. He has served on several International Advisory boards to conferences, acted as co-Chair at an E-MRS Symposium and a SPIE Symposium and has edited several conference proceedings for J. Crystal Growth and J. Materials Science. He is also currently on the editorial board of the Journal of Materials Science: Materials in Electronics.

Capturing the essence of current trends, markets, design tools and technologies in the field of crystal growth, these internationally acclaimed expert editors have put together a handy reference tailor-made for readers facing the threshold challenges between research and industrial applications. <p>Following a look at general aspects, the book is divided into relevant parts looking at the simulation of industrial growth processes, compound semiconductors, halide and oxide crystals, and crystal machining, as well as the potential of crystal growth for sustaining energy.</p> <p>With many figures, tables and schemes, this book is a must-have for industrial and research chemists, physicists and engineers.</p>

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