Catalytic Chemical Vapor DepositionTechnology and Applications of Cat-CVD
The authoritative reference on catalytic chemical vapor deposition?written by the inventor of the technology This comprehensive book covers a wide scope of Cat-CVD and related technologies?from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field?including the father of catalytic chemical vapor deposition?it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. -Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) -Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles -Presents comparisons of different Cat-CVD methods which are usually not found in research papers -Bridges academic and industrial research?showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
INTRODUCTION Thin Film Technologies Birth of Cat-CVD Research History of Cat-CVD and Related Technologies Structure of this book FUNDAMENTALS FOR STUDYING ON PHYSICS OF CAT-CVD AND DIFFERENCE FROM PECVD Fundamental Physics in Deposition Chamber Fundamental Difference between Cat-CVD and PECVD Apparatuses Features of Conventional PECVD Drawback of PECVD and Technology Overcoming Them Features of Cat-CVD as Technology Overcoming Drawback of PECVD FUNDAMENTALS FOR ANALYTICAL METHODS FOR REVEALING CHEMICAL REACTIONS IN CAT-CVD Importance of Radical Process in CVD Processes Radical Detection Technique One-Photon Laser Induced Fluorescence (LIF) Two-Photon Laser Induced Fluorescence Single Path VUV Laser Absorption Other Laser Spectroscopic Techniques Mass Spectrometric Technique PHYSICS AND CHEMISTRY OF CAT-CVD Kinetics of Molecules in Chambers Gas Temperature Distribution in Cat-CVD Chambers Decomposition Processes on Metal Wire Surfaces Model of Decomposition of SiH4 on Metal Surfaces Summary: Film Deposition Mechanisms in Cat-CVD PROPERTIES OF FILMS PREPARED BY CAT-CVD Properties of Amorphous-Silicon (a-Si) Crystallization of Silicon Films and Micro-Crystalline Silicon Properties of Silicon-Nitride (SiNx) Formation and Properties of SiOxNy Properties of Silicon-Dioxide (SiO2) Prepared by Cat-CVD Properties of Aluminum-Oxide (Al2O3) Properties of Other Inorganic Films Summary: What can be made by Cat-CVD? ORGANIC POLYMER SYNTHESIS BY CAT-CVD RELATED TECHNOLOGY - INITIATED CVD (I-CVD) PTFE Synthesis by Cat-CVD Related Technology Various Organic Films Prepared by Cat-CVD Related Technology and i-CVD Sources and Deposition Conditions for Synthesized Various Organic Films Mechanism of Organic Film Formation by i-CVD Summary and Future Prospect of i-CVD PHYSICS AND TECHNOLOGIES FOR OPERATING CAT-CVD APPARATUSES Influence of Gas Flow in Cat-CVD Apparatuses Factors Deciding Film Uniformity Limit of Packing Density of Catalyzing Wires Thermal Radiation from Heated Catalyzers Contamination from Heated Catalyzers Lifetime of Catalyzing Wires and Techniques to Expand Lifetime Chamber Cleaning Mass-Production Machines APPLICATIONS OF CAT-CVD FILMS Solar Cells Thin Film Transistors (TFT) Surface Passivation on Compound Semiconductor Devices Gas Barrier Films for Various Devices Such As Organic Devices Gas Barrier Films for Food Packages ULSI Application of Cat-CVD SiNx Films Other Applications of Inorganic Films Typical Application of Organic Films Summary of Various Application and Future Prospects RADICALS GENERATED IN CAT-CVD APPARATUS AND THEIR APPLICATION Generation of High Density Hydrogen (H) Atoms Cleaning and Etching by H Atoms Generated in Cat-CVD Apparatuses Photo-Resist Removal by Hydrogen Atoms Low Temperature Formation of Low Resistivity Metal Lines from Liquid Inks by H Atoms Low Temperature Surface Oxidation and Nitridation "Cat-Sputtering" - A New Thin Film Deposition Utilizing Radicals A NEW LOW TEMPERATURE IMPURITY DOPING TECHNOLOGY- CAT-DOPING Invention of Cat-Doping Low Temperature and Shallow Phosphorus (P) Doping into c-Si Low Temperature Boron (B) Doping into c-Si Low Temperature Nitrogen Doping into Silicon-Carbide (SiC) Feasibility of Cat-Doping for Various Applications SUMMARY AND FUTURE PROSPECTS OF CAT-CVD
Hideki Matsumura is Professor Emeritus in the School of Materials Science at the Japan Advanced Institute of Science and Technology (JAIST), Japan. He has joined JAIST as Professor after working at the University of Surrey, England, and the Tokyo Institute of Technology and University of Hiroshima, Japan. During employment at JAIST as Research Professor he developed the method of Catalytic Chemical Vapor Deposition (Cat-CVD) and worked with the Ministry of Economy, Trade and Industry of Japan to commercialize this technology and its applications. For these achievements he received the Government Award for Successful Collaboration between Academia and Industry from the Japanese government in 2007. Hironobu Umemoto is Professor of Chemistry and Bioengineering at the Faculty of Engineering of the University of Shizuoka, Japan. He received his PhD from the Tokyo Institute of Technology in 1980 and subsequently worked there as Assistant Professor. In 1994 he joined the University of Shizuoka as Associate Professor. His research is focused on the fundamental understanding and the application of chemical vapor deposition. Karen K. Gleason is Associate Provost and the Alexander and I. Michael Kasser Professor of Chemical Engineering at MIT, USA. At MIT, she has served as Executive Officer of the Chemical Engineering Department; Associate Director for the Institute of Soldier Nanotechnologies; and as Associate Dean of Engineering for Research. Her awards include the ID TechEx Printed Electronics Europe Best Technical Development Materials Award, the AIChE Process Development Research Award, and Young Investigator Awards from both the National Science Foundation and the Office of Naval Research. Ruud E. I. Schropp is currently Senior Researcher at Solliance Solar Research, Eindhoven, The Netherlands. After his PhD, obtained from the University of Groningen, he was Research and Development Manager at Glasstech Solar, Colorado, United States. Subsequently he worked at the University of Utrecht in various capacities and more recently in different roles at start-ups and commercial and non-commercial research centers.
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