Details

Atomic Layer Deposition of Nanostructured Materials


Atomic Layer Deposition of Nanostructured Materials


1. Aufl.

von: Nicola Pinna, Mato Knez

155,00 €

Verlag: Wiley-VCH
Format: PDF
Veröffentl.: 19.09.2012
ISBN/EAN: 9783527639939
Sprache: englisch
Anzahl Seiten: 472

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Beschreibungen

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
PART I: Introduction to ALD THEORETICAL MODELING OF ALD PROCESSES Introduction Overview of Atomistic Simulations Calculation of Properties Using Quantum Simulations Prediction of ALD Chemical Mechanisms Example of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and Water STEP COVERAGE IN ALD Introduction Growth Techniques Step Coverage Models in ALD Experimental Verifications of Step Coverage Models Summary PRECURSORS FOR ALD PROCESSES Introduction General Requirements for ALD Precursors Metallic Precursors for ALD Nonmetal Precursors for ALD Conclusions SOL-GEL CHEMSTRY AND ATOMIC LAYER DEPOSITION Aqueous and Nonaqueous Sol-Gel in Solution Sol-Gel and ALD: An Overview Mechanistic and In Situ Studies MOLECULAR LAYER DEPOSITION OF HYBRID ORGANIC-INORGANIC FILMS Introduction General Issues for MLD of Hybrid Organic-Inorganic Films MLD Using Trimethylaluminum and Ethylene Glycol in an AB Process Expansion to an ABC Process Using Heterobifunctional and Ring-Opening Precursors Use of a Homotrifunctional Precursor to Promote Cross-Linking in an AB Process MLD of Hybrid Alumina-Siloxane Films Using an ABCD Process Future Prospects for MLD of Hybrid Organic-Inorganic Films´ LOW-TEMPERATURE ATOMIC LAYER DEPOSITION Introduction Challenges of LT-ALD Materials and Processes Toward Novel LT-ALD Processes Thin Film Gas Diffusion Barriers Encapsulation of Organic Electronics Conclusions PLASMA ATOMIC LAYER DEPOSITION Introduction Plasma Basics Plasma ALD Configurations Merits of Plasma ALD Challenges for Plasma ALD Concluding Remarks and Outlook PART II: Nanostructures by ALD ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS Introduction ALD Layers for Memory Devices ALD for Logic Devices Concluding Remarks NANOPATTERNING BY AREA-SELECTIVE ATOMIC LAYER DEPOSITION Concept of Area-Selective Atomic Layer Deposition Change of Surface Properties Patterning Applications of AS-ALD Current Challenges COATINGS ON HIGH ASPECT RATIO STRUCTURES Introduction Models and Analysis Characterization Methods for ALD Coatings in High Aspect Ratio Structures Examples of ALD in High Aspect Ratio Structures Nonideal Behavior during ALD in High Aspect Ratios Conclusions and Future Outlook COATINGS OF NANOPARTICLES AND NANOWIRES ALD on Nanoparticles Vapor-Liquid-Solid Growth of Nanowires by ALD Atomic Layer Epitaxy on Nanowires ALD on Semiconductor NWs for Surface Passivation ALD-Assisted Formation of Nanopeapods Photocorrosion of Semiconductor Nanowires Capped by ALD Shell Interface Reaction of Nanowires with ALD Shell ALD ZnO on NWs/Tubes as Seed Layer for Growth of Hyperbranch Conclusions ATOMIC LAYER DEPOSITION ON SOFT MATERIALS Introduction ALD on Polymers for Passivation, Encapsulation, and Surface Modification ALD for Bulk Modification of Natural and Synthetic Polymers and Molecules ALD for Polymer Sacrificial Templating: Membranes, Fibers, and Biological and Optical Structures ALD Nucleation of Patterned and Planar SAMs and Surface Oligomers Reactions during Al2O3 ALD on Representative Polymer Materials Summary APPLICATION OF ALD TO BIOMATERIALS AND BIOCOMPATIBLE COATINGS Application of ALD to Biomaterials Biocompatible Coatings Summary COATING OF CARBON NANOTUBES Introduction Purification and Surface Functionalization of Carbon Nanotubes Decoration/Coating of Carbon Nanotubes by Solution Routes Decoration/Coating of Carbon Nanotubes by Gas-Phase Techniques Atomic Layer Deposition on Carbon Nanotubes Coating of Large Quantity of CNTs by ALD ALD Coating of Other sp2-Bonded Carbon Materials Conclusions INVERSE OPAL PHOTONICS Introduction and Background Properties of Three-Dimensional Photonic Band Structures Large-Pore and Non-Close-Packed Inverse Opals Experimental Studies Tunable PC Structures Summary NANOLAMINATES Introduction Optical Applications Thin Film Encapsulation Applications in Electronics Copper Electroplating Applications Solid Oxide Fuel Cells Complex Nanostructures Summary CHALLENGES IN ATOMIC LAYER DEPOSITION Introd
Nicola Pinna studied physical chemistry at the Université Pierre et Marie Curie (Paris). He received his PhD in 2001, and in 2002, he moved to the Fritz Haber Institute of the Max Planck Society (Berlin). In 2003, he joined the Max Planck Institute of Colloids and Interfaces (Potsdam). In 2005, he moved to the Martin Luther University, Halle-Wittenberg, as an Assistant Professor of Inorganic Chemistry. Since 2006 he is researcher at the Department of Chemistry and CICECO of the University of Aveiro and since 2009 he is also Assistant Professor at the School of Chemical and Biological Engineering of the Seoul National University. In 2011 he was ranked among the top 100 materials scientists of the past decade by impact. His research activity is focused on the development of novel routes to nanostructured materials, their characterization, and the study of their physical properties. Mato Knez studied chemistry at the University of Ulm in Germany. He did his dissertation at the Max Planck Institute of solid state research in Stuttgart from 2000-2003. In 2003 he joined the Max Planck Institute for Microstructure Physics in Halle as a Postdoc where he established the ALD-based research direction. Since 2006 he is leading a research group funded by the German Ministry of Education and Research (BMBF). In January 2012 he will join CIC nanoGUNE in San Sebastian (Spain) as an Ikerbasque Research Professor. His research activities are mainly focused on various aspects of the application of ALD, including the synthesis of optical nanolaminates, infi ltration mechanisms when ALD is applied to soft materials, and ALD-assisted nanofabrication of photonic and plasmonic structures. Aside from ALD he has strong research activites in biotemplated inorganic nanostructures for applications in nanotechnology and medicine.
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

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