Details

Advanced Nano Deposition Methods


Advanced Nano Deposition Methods


1. Aufl.

von: Yuan Lin

120,99 €

Verlag: Wiley-VCH
Format: EPUB
Veröffentl.: 07.09.2016
ISBN/EAN: 9783527696475
Sprache: englisch
Anzahl Seiten: 328

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Beschreibungen

This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. <br> Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
<p>List of Contributors XIII</p> <p><b>1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure 1</b><br /><i>Chunrui Ma and Chonglin Chen</i></p> <p>1.1 Introduction 1</p> <p>1.2 Pulsed Laser Deposition System Setup 2</p> <p>1.3 Advantages and Disadvantages of Pulsed Laser Deposition 3</p> <p>1.4 TheThermodynamics and Kinetics of Pulsed Laser Deposition 3</p> <p>1.5 Monitoring of Growth Kinetics 8</p> <p>1.6 Fundamental Parameters inThin Film Growth 10</p> <p>1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth 13</p> <p>1.8 Pulsed Laser Deposition for Nanostructure Growth 23</p> <p>1.9 Variation of Pulsed Laser Deposition 24</p> <p>1.10 Conclusion 24</p> <p>References 25</p> <p><b>2 Electron Beam Evaporation Deposition 33</b><br /><i>Zhongping Wang and Zengming Zhang</i></p> <p>2.1 Introduction 33</p> <p>2.2 Electron Beam Evaporation System 35</p> <p>2.3 Characterization ofThin Film 45</p> <p>2.4 Summary 53</p> <p>Acknowledgments 53</p> <p>References 53</p> <p><b>3 Nanostructures and Thin Films Deposited with Sputtering 59</b><br /><i>Weiqing Yang</i></p> <p>3.1 Introduction 59</p> <p>3.2 Nanostructures with Sputtering 60</p> <p>3.3 Thin Films Deposited with Sputtering 71</p> <p>3.4 Summary 76</p> <p>Acknowledgments 77</p> <p>References 77</p> <p><b>4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 81</b><br />Wen Huang</p> <p>4.1 Introduction 81</p> <p>4.2 Technology of MBE 82</p> <p>4.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy 91</p> <p>4.4 Quantum Dots Development with Molecular Beam Epitaxy 101</p> <p>4.5 Summary 103</p> <p>Acknowledgments 104</p> <p>References 104</p> <p><b>5 Carbon Nanomaterials and 2D Layered Materials Development with Chemical Vapor Deposition 105</b><br /><i>Taisong Pan</i></p> <p>5.1 Introduction 105</p> <p>5.2 Carbon Nanotube Synthesis by Chemical Vapor Deposition 106</p> <p>5.3 Graphene Synthesis by Chemical Vapor Deposition 112</p> <p>5.4 Metal Dichalcogenide Synthesis by Chemical Vapor Deposition 115</p> <p>5.5 Summary 119</p> <p>References 120</p> <p><b>6 Nanostructures Development with Atomic Layer Deposition 123</b><br /><i>Hulin Zhang</i></p> <p>6.1 Introduction 123</p> <p>6.2 Reaction Mechanisms 125</p> <p>6.3 Nanostructures Based on ALD 131</p> <p>6.4 Summary 136</p> <p>Acknowledgments 137</p> <p>References 138</p> <p><b>7 Nanomaterial Development with Liquid-Phase Epitaxy 141</b><br /><i>Weiqing Yang</i></p> <p>7.1 Introduction 141</p> <p>7.2 Hydrothermal Method 142</p> <p>7.3 Nanostructures Fabricated Using LPE 147</p> <p>7.4 Summary 156</p> <p>Acknowledgments 156</p> <p>References 156</p> <p><b>8 Nanostructural Thin Film Development with Chemical Solution Deposition 159</b><br /><i>Yanda Ji and Yuan Lin</i></p> <p>8.1 Introduction 159</p> <p>8.2 Precursor Solution Preparation 159</p> <p>8.3 Coating 162</p> <p>8.4 Thermal Treatment 163</p> <p>8.5 Control of the Microstructures in Thin Films Prepared by CSD Techniques 164</p> <p>8.6 Examples of NanostructuralThin Films Prepared by CSD Techniques 167</p> <p>8.7 Summary 174</p> <p>References 175</p> <p><b>9 Nanomaterial Development Using In Situ Liquid Cell Transmission Electron Microscopy 179</b><br /><i>Xin Chen,Wangfan Zhou, Debiao Xie, and Hongliang Cao</i></p> <p>9.1 Introduction 179</p> <p>9.2 The Technological Development of In Situ Liquid Cell TEM 179</p> <p>9.3 Nanomaterial Development Using In Situ Liquid Cell TEM Technology 185</p> <p>9.4 Summary and Outlook 191</p> <p>Acknowledgments 191</p> <p>References 192</p> <p><b>10 Direct-Writing Nanolithography 195</b><br /><i>Min Gao</i></p> <p>10.1 Introduction 195</p> <p>10.2 Electron Beam Lithography 195</p> <p>10.3 Focused Ion Beam Lithography 198</p> <p>10.4 Gas-Assisted Electron and Ion Beam Lithography 200</p> <p>10.5 SPM Lithography 201</p> <p>10.6 Dip-Pen Lithography 205</p> <p>10.7 Summary 206</p> <p>Acknowledgments 207</p> <p>References 207</p> <p><b>11 3D Printing of Nanostructures 209</b><br /><i>Min Gao</i></p> <p>11.1 Introduction 209</p> <p>11.2 3D Printing Processes 209</p> <p>11.3 Types of 3D Printing 210</p> <p>11.4 3D Direct LaserWriting by Multiphoton Polymerization 214</p> <p>11.5 3D Printing Applications 217</p> <p>11.6 Summary 219</p> <p>Acknowledgments 220</p> <p>References 220</p> <p><b>12 Nanostructured Thin Film Solid Oxide Fuel Cells 223</b><br /><i>Alex Ignatiev, Rabi Ebrahim, Mukhtar Yeleuov, Daniel Fisher, Xin Chen, NaijuanWu, and Serekbol Tokmoldin</i></p> <p>12.1 Introduction 223</p> <p>12.2 Solid Oxide Fuel Cells 223</p> <p>12.3 Summary 237</p> <p>Acknowledgments 237</p> <p>References 237</p> <p><b>13 Nanostructured Magnetic Thin Films and Coatings 239</b><br /><i>Goran Rasic</i></p> <p>13.1 Introduction 239</p> <p>13.2 High-Frequency Devices 240</p> <p>13.3 Magnetic Information Storage Devices 251</p> <p>13.4 Summary 261</p> <p>Acknowledgments 261</p> <p>References 262</p> <p><b>14 Phase Change Materials for Memory Application 267</b><br /><i>Liangcai Wu and Zhitang Song</i></p> <p>14.1 Introduction 267</p> <p>14.2 Ge2Sb2Te5 and Its Properties’ Improvement 268</p> <p>14.3 High-Speed and Lower-Power TiSbTe Materials 277</p> <p>14.4 Summary 283</p> <p>Acknowledgments 283</p> <p>References 283</p> <p><b>15 Nanomaterials and Devices on Flexible Substrates 285</b><br /><i>Hulin Zhang</i></p> <p>15.1 Introduction 285</p> <p>15.2 Nanomaterials on Flexible Substrates 286</p> <p>15.3 Devices on Flexible Substrates 292</p> <p>15.4 Summary 300</p> <p>Acknowledgments 301</p> <p>References 301</p> <p>Index 305</p>
Yuan Lin obtained her PhD in condensed materials from the University of Science and Technology in Hefei, China, in 1999. She continued as a research associate in the Institute of Physics at the Chinese Academic Science in Bejing, China, followed by the University of Houston and Los Alamos National Laboratory, USA, as well as a senior engineer at Intel Corp., USA.<br> Currently, she is a Yangtze River Scholar Chair Professor at the University of Electronic Science and Technology in Chengdu, China. She has worked in the field of thin film and nanomaterials for about 20 years. Her area of expertise includes advanced material research using pulsed laser deposition, rf-sputtering and chemical-solution deposition.<br> Dr. Lin has authored more than 90 scientific publications and 13 patents.

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